DEVELOPMENT OF A TECHNIQUE FOR CONDUCTOMETRIC DETERMINATION OF THE CRITICAL MICELLIZATION CONCENTRATION FOR TESTING CATIONIC SURFACTANT-BASED PRODUCTS
Rubrics: 1. CHEMISTRY
Authors:
2.
KNITU
3.
KNITU
Type:
Article
Pages:
from 5
to 10
Status:
In work
Received:
10.11.2024
Accepted:
08.12.2024
Published:
08.12.2024
Language:
Russian
Keywords:
SURFACTANTS, TENSIOMETRIC ANALYSIS METHOD, CONDUCTOMETRIC ANALYSIS METHOD, SURFACE TENSION
Abstract (English):
The unprecedented growth in the production of surfactants and surfactant-based products has led to an urgent need to improve quality control methods for both surfactants and final products. Standardization plays a key role in this area, guaranteeing high measurement accuracy and consistently high product quality. However, the existing standards do not always meet the modern requirements of high-tech production, which are characterized by increased requirements to sensitivity, accuracy, as well as expressiveness of analysis. This implies not only the development of new, more advanced standardized control methods, but also a significant modernization of existing ones, expanding their scope of application and adapting them to new types of surfactants and production conditions. This work is devoted to the urgent task of developing an improved tensiometric method for determining the critical micellization concentration (CMC) for cationic surfactants (CSs). CMC is the most important quality indicator of surfactants, characterizing their ability to self-associate in solutions and affecting the efficiency of their use in various fields, from the cosmetics industry to oil production. Existing methods, including GOST 29232-91 (ISO 4311-77), focus primarily on anionic and non-ionic surfactants, and their application to surfactants is often subject to significant errors due to the specific properties of cationic molecules. These properties include, for example, a higher tendency to adsorb on the surface of measuring equipment and a stronger influence of the presence of electrolytes in solution on the CMC . After the work on development and metrological certification of the improved tensiometric method, it will be recommended for quality and purity control of industrial samples of CSs.
The unprecedented growth in the production of surfactants and surfactant-based products has led to an urgent need to improve quality control methods for both surfactants and final products. Standardization plays a key role in this area, guaranteeing high measurement accuracy and consistently high product quality. However, the existing standards do not always meet the modern requirements of high-tech production, which are characterized by increased requirements to sensitivity, accuracy, as well as expressiveness of analysis. This implies not only the development of new, more advanced standardized control methods, but also a significant modernization of existing ones, expanding their scope of application and adapting them to new types of surfactants and production conditions. This work is devoted to the urgent task of developing an improved tensiometric method for determining the critical micellization concentration (CMC) for cationic surfactants (CSs). CMC is the most important quality indicator of surfactants, characterizing their ability to self-associate in solutions and affecting the efficiency of their use in various fields, from the cosmetics industry to oil production. Existing methods, including GOST 29232-91 (ISO 4311-77), focus primarily on anionic and non-ionic surfactants, and their application to surfactants is often subject to significant errors due to the specific properties of cationic molecules. These properties include, for example, a higher tendency to adsorb on the surface of measuring equipment and a stronger influence of the presence of electrolytes in solution on the CMC . After the work on development and metrological certification of the improved tensiometric method, it will be recommended for quality and purity control of industrial samples of CSs.
Keywords:
SURFACTANTS, TENSIOMETRIC ANALYSIS METHOD, CONDUCTOMETRIC ANALYSIS METHOD, SURFACE TENSION
SURFACTANTS, TENSIOMETRIC ANALYSIS METHOD, CONDUCTOMETRIC ANALYSIS METHOD, SURFACE TENSION
