New source of plasma perturbations caused by a Langmuir probe is disclosed. Th е phenomenon appears when a bare metal screen surrounding a probe-holder is incorporated. While in contact with plasmas that generally have a non-uniform space potential distribution, the screen diverts a portion of plasma current (discharge or ambipolar one) which is reduced lowering plasma ionization degree. In this situation the probe-holder’s screen behaves like a short-circuited, asymmetric double macro-probe. Understanding the essence of a new perturbation mechanism gives the way to its minimization: one has to insulate the screen from plasma.
зонд Ленгмюра, плазма, зондовые возмущения, ВЧ наводки, проводящее тело, Langmuir probe, plasma, probe perturbations, RF interference, conducting body
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