The model of the formation of the iron - rich silicide in the thin film under high dose Fe-ion implantation into silicon is purposed. Atoms diffusing within two- dimensional layer attach the growing cluster only if their concentration in vicinity of the cluster is enough for needed phase formation. The described feature of cluster growth results in the formation of dense structures with the fractal dimension of order of 1.85-1.9. Magnetic interaction of diffusing atoms with growing ferromagnetic cluster leads to the sufficient elongation of the cluster. This elongation can be a source of uniaxial magnetic anisotropy in plane of the implanted layer.
Агрегация, ограниченная диффузией, фрактальная размерность, дендриты, диполь-дипольное взаимодействие, ионная имплантация, Diffusion limited aggregation, fractal dimension, dendrites, dipole-dipole interaction, ion implantation
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