A mathematical model of the RF plasma flow at a pressure of 0.1-10 Pa for Knudsen 0.3 ≤ Kn ≤ 3 is described. The model is based on the statistical approach of the neutral component of the RF plasma. The results of the plasma flow calculation with a specimen is described.
аргон-силановая плазма, высокочастотный разряд, осаждение тонких пленок, аморфный кремний, струйное течение, математическое моделирование, silane argon plasma, RF glow discharge, thin films deposition, amorphous silicon, jet flow, mathematical modeling
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